奈米孔洞元件

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奈米孔洞元件

發布時間: 2023-03-22 15:12

Norcada

Norcada的奈米孔嵌入式元件（NTPR和NXPR）結合了我們的膜技術和高精度奈米製造技術，提供每個裝置中只有一個直徑最小為7.0nm的孔。這些裝置專為基因組學、蛋白質組學和其他納米孔應用以及二維膜特性表徵而設計。奈米孔裝置提供各種定制選項和附加功能。
奈米孔洞元件特點
▪ Silicon frames, round or square form factor, 3mm to 10mm lateral dimensions ▪ High Resistivity (-HR) or Low Resistivity (-LR) Silicon frame
▪ SiNx window sizes 5µmx5µm to 1mmx1mm
▪ SiNx membrane thickness of 12nm to 500nm
▪ Pore diameters of 7nm to 2000nm
▪ 3nm dia. pores as special order
▪ Noise reducing SiO2 Under Layers (UL) between the SiNx layer and the Silicon frame, not present in the membrane area
▪ Hydrophilic SiOx Top Layer (TL) coatings for enhanced wettability
奈米孔洞元件系列規格
NanoPore Silicon Nitride (SiNx) Windows in TEM Silicon Frames

Part Number	Pore Diameter	SiNx Thick.	Under Layer / Top Layer
NTPR001XA-10nm-HR	10±3nm	40±4nm	N/A
NTPR001XA-12nm-HR	12±4nm	40±4nm	N/A
NTPR001X-20nm-HR	20±4nm	30±4nm	N/A
NTPR001X-25nm-HR	25±4nm	30±4nm	N/A
NTPR001Y-30nm-HR	30±4nm	20±3nm	N/A

NanoPore Silicon Nitride (SiNx) Windows in Square 4×4mm Frames

Part Number	Pore Diameter	SiNx Thick.	Under Layer / Top Layer
NXPR4001X-20nm-AO/O-HR	20±4nm	30±4nm	UL: 60nm SiO2
NXPR4001XA-20nm-AO/O-HR	20±5nm	40±4nm	UL: 60nm SiO2
NXPR4001XA-20nm-HR	20±7nm	40±7nm	N/A
NXPR4001X-25nm-AO/O-HR	25±4nm	30±4nm	UL: 60nm SiO2
NXPR4001Y-30nm-AO/O-HR	30±4nm	20±3nm	UL: 60nm SiO2
NXPR4001Y-30nm-HR	30±4nm	20±3nm	N/A
NXPR4001XA-30nm-HR	30±7nm	40±7nm	N/A