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Exicor® AT 雙折射量測系統
    發布時間: 2025-07-28 10:45    
Hinds Instruments
Hinds Instruments

Exicor® AT 雙折射量測系統

Hinds Instruments的雙折射測量技術已被全球業界領導者廣泛採用,以無與倫比的精度、分辨率和重複性測量雙折射並表徵材料中的應力雙折射。 這些系統能夠以0.001奈米的分辨率測量光學遲滯,噪聲底線低至0.005奈米,結構堅固、動態靈活且可擴展,以滿足您應用場景的嚴苛要求。我們提供涵蓋光譜範圍(深紫外DUV、可見光VIS和近紅外NIR)的測量系統,能夠測量幾乎所有光學材料。 AT系列是Exicor雙折射測量系統產品家族的原始成員。它也包括主力型號,同時服務於研發和生產需求。

Exicor® AT 雙折射量測系統 系列規格

Exicor® 120AT
Exicor® 120AT
Exicor® 150AT
Exicor® 150AT

Exicor® 250AT
Exicor® 300AT
Exicor® 300AT
Exicor® 500AT
Exicor® 500AT
System Size 715mm (H) x 350mm (W) x 360mm (D) 413mm (W) x 693mm (D) x 909mm (H) 910mm (H) x 415mm (W) x 700mm (D) 120cm (L) x 130cm (W) x 200cm (H) 150cm (L) x 150cm (W) x 200cm (H)
Max. Sample Size up to 120mm x 100mm up to 150mm x 150mm up to 250mm x 250mm up to 300mm x 300mm and 250+mm thick up to 500mm X 500mm and 400+mm thick

Exicor® AT 雙折射量測系統 特點

Features of 120AT, 150AT & 250AT Models
  • Automated XY stage
  • 2D and 3D graphical representation of birefringence parameters
  • Bench top design
  • Flexible stage design for adding custom parts holders or process aids
  • Advanced data analysis features included standard in user interface
Features of 300AT & 500AT Models
  • Heavy duty automated XY stage
  • 2D and 3D graphical representation of birefringence parameters
  • 3-sided easy access stage loading design
  • Large and flexible stage platform design for adding custom parts holders or process aids
  • Advanced data analysis features included standard in user interface

Exicor® AT 雙折射量測系統 通用參數

120AT All Other AT Models
Retardation Range: 0.005 to 300+ nm 0.005 to 300+ nm
Retardation Resolution / Repeatability¹,²: 0.001 nm / ± 0.02 nm 0.001 nm / ± 0.015 nm
Angular Resolution / Repeatability¹: 0.01º / ± 0.07° 0.01º / ± 0.07°
Measurement Rate / Time³: 15 samples/sec (at 1nm spacing) up to 100 pps / sample size dependent
Light Source Wavelength⁴: Various (625nm standard) Various (632.8 nm standard)
Measurement Spot Diameter⁵: Between 1 mm and 3 mm (can be as low as <50 µm) Between 1 mm and 3 mm (can be as low as <50 µm)
Modulation Technique / Frequency: PEMLabsTM Photoelastic Modulator / 50 kHz and 50/60 kHz PEMLabsTM Photoelastic Modulator / 50 kHz and 50/60 kHz
Demodulation Analysis Technique: Hinds Instruments SignalocTM Lock-in Amplifier Hinds Instruments SignalocTM Lock-in Amplifier
Measurement Units: nm (retardation), ° (angle) nm (retardation), ° (angle)
1 Typical performance at 5nm retardation
2 Up to 1.5 nm, 1% thereafter
3 Maximum data collection speed. Sample XY scan time dependent on stage movement parameters.
4 Custom wavelengths available
5 Measurement spot sizes of less than 1mm (native) require optional high resolution detector module
服務熱線:886-2-2655-2200  業務咨詢:151 / 維修校正:185
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